Zirconium nitride (ZrN) is widely used in many industrial sectors for its outstanding performances including its mechanical properties, high chemical and thermal stability. Associated with its plasmonic behavior, these properties make ZrN a suitable candidate for optical applications at high temperature or in extreme environments. The authors present an innovative, easy-to-use and rapid process for producing ZrN thin films from a photo-structurable ZrO 2 sol-gel using a rapid thermal nitridation (RTN) process. In this process, a ZrO 2 sol-gel layer is converted into a ZrN thin film in a few minutes by rapid thermal annealing (RTA) under ammonia gas. Compared to physical or chemical vapor deposition, usually used to produce ZrN thin films, the advantages of the sol-gel method include suitability for non-planar and large substrates and the possibility of nanotexturing of crystallized ZrN surfaces in considerably less time, at a larger scale and at a lower cost. The ZrO 2 and ZrN thin films were characterized by Raman spectroscopy, X-ray diffraction and Transmission Electron Microscopy, to confirm complete nitridation. The optical, electrical and tribological properties were also investigated. Finally, the nitridation method was also used on structured ZrO 2 layers and showed the versatility of the process e.g. enabling the production of micro-nanostructured ZrN films without using any etching techniques.