Loading...
Derniers dépôts
-
-
-
-
-
Moustapha Jaffal, Taguhi Yeghoyan, Gauthier Lefèvre, Rémy Gassilloud, Nicolas Possémé, et al.. Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches. Journal of Vacuum Science & Technology A, 2021, 39 (3), pp.030402. ⟨10.1116/6.0000969⟩. ⟨hal-03180749⟩