Pulsewidth-switchable ultrafast source at 114 nm - Institut d'Optique Graduate School
Journal Articles Optics Letters Year : 2023

Pulsewidth-switchable ultrafast source at 114 nm

Abstract

Femtosecond laser sources with high repetition rate are fundamental tools enabling tabletop time-resolved and angle-resolved photoemission spectroscopy in solids. The UV and vacuum UV laser light required for the photoemission process can be generated through various frequency up-conversion techniques. We describe a VUV source at 114 nm (10.8 eV) based on an industrial grade ytterbium-doped ultrafast laser, a nonlinear pulsewidth selection stage, and two cascaded frequency tripling stages, first in crystals, second in xenon. The role of ionization in gas-based perturbative third harmonic generation phase-matching is analyzed using a simple theory, numerical simulations, and experimental data. The source features high photon flux, high repetition rate and adjustable time resolutions. Thereby, in combination with a state-of-the-art ARPES apparatus it enables the study of the electronic dynamics of the whole Brillouin zone in a large number of materials.
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Dates and versions

hal-04192119 , version 1 (31-08-2023)

Identifiers

Cite

Anahita Omoumi, Michele Natile, Evangelos Papalazarou, Yoann Zaouter, Thierry Auguste, et al.. Pulsewidth-switchable ultrafast source at 114 nm. Optics Letters, 2023, 48 (17), pp.4625-4628. ⟨10.1364/OL.498266⟩. ⟨hal-04192119⟩
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